Bell magnetron sputtering machine Bell Size: 500 × 240mm Ultimate vacuum: 6.7 × 10-3Pa ≤ 15min Vacuum system: F-250 molecular pump Baking the substrate temperature: 300 degrees adjustable control Air system: a mass flow controller DC sputtering power supply power: 3KW (constant current control) RF sputtering power supply power: 2KW Substrate size: 4 "(station 6 bit) Target Size: 150mm Target surface to the substrate position adjustable Workpiece speed :0-20rpm disc. Compressed air: 0.45MPa.